Publication:

Cost-effective cleaning for advanced Si-processing

Date

1998
Proceedings Paper
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dc.contributor.authorHeyns, Marc
dc.contributor.authorBearda, Twan
dc.contributor.authorCornelissen, Ingrid
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorKnotter, D. M.
dc.contributor.authorLoewenstein, Lee
dc.contributor.authorLux, Marcel
dc.contributor.authorMertens, Paul
dc.contributor.authorMertens, S.
dc.contributor.authorMeuris, Marc
dc.contributor.authorSchaekers, Marc
dc.contributor.authorSnee, Peter
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorVos, Rita
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorCornelissen, Ingrid
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorVos, Rita
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-09-30T12:11:39Z
dc.date.available2021-09-30T12:11:39Z
dc.date.embargo9999-12-31
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2633
dc.source.beginpage325
dc.source.conferenceTechnical Digest International Electron Devices Meeting - IEDM
dc.source.conferencedate6/12/1998
dc.source.conferencelocationSan Francisco, CA USA
dc.source.endpage328
dc.title

Cost-effective cleaning for advanced Si-processing

dc.typeProceedings paper
dspace.entity.typePublication
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