Publication:
Interpretation of spectroscopic ellipsometry measurements of ultrathin dielectric layers on silicon: impact of accuracy of the silicon optical constants
Date
| dc.contributor.author | Tonova, Diana | |
| dc.contributor.author | Depas, Michel | |
| dc.contributor.author | Vanhellemont, Jan | |
| dc.date.accessioned | 2021-09-29T15:32:50Z | |
| dc.date.available | 2021-09-29T15:32:50Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 1996 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/1536 | |
| dc.source.beginpage | 64 | |
| dc.source.endpage | 68 | |
| dc.source.journal | Thin Solid Films | |
| dc.source.volume | 288 | |
| dc.title | Interpretation of spectroscopic ellipsometry measurements of ultrathin dielectric layers on silicon: impact of accuracy of the silicon optical constants | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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| Publication available in collections: |