Publication:

Optical proximity effects and correction strategies for chemical amplified DUV resists

Date

1996
Proceedings Paper
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dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorBruggeman, Albert
dc.contributor.authorBotermans, Harry
dc.contributor.authorVan Driessche, Veerle
dc.contributor.authorYen, Anthony
dc.contributor.authorTritchkov, Alexander
dc.contributor.authorJonckheere, Rik
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorVan Driessche, Veerle
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2021-09-29T15:16:03Z
dc.date.available2021-09-29T15:16:03Z
dc.date.embargo9999-12-31
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1399
dc.source.beginpage622
dc.source.conferenceOptical Microlithography IX
dc.source.conferencedate10/03/1996
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage633
dc.title

Optical proximity effects and correction strategies for chemical amplified DUV resists

dc.typeProceedings paper
dspace.entity.typePublication
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