Quantum Transport Study of Contact Resistance of Edge- and Top-Contacted Two-Dimensional Materials

dc.contributor.author	Deylgat, Emeric
dc.contributor.author	Chen, Edward
dc.contributor.author	Soree, Bart
dc.contributor.author	Vandenberghe, William G.
dc.contributor.imecauthor	Deylgat, Emeric
dc.contributor.imecauthor	Soree, Bart
dc.contributor.orcidimec	Soree, Bart::0000-0002-4157-1956
dc.date.accessioned	2024-03-21T10:45:36Z
dc.date.available	2024-01-11T17:16:16Z
dc.date.available	2024-03-21T10:45:36Z
dc.date.issued	2023
dc.description.wosFundingText	This work has been supported by the Taiwan Semiconductor Manufacturing Company, Ltd.
dc.identifier.eisbn	978-4-86348-803-8
dc.identifier.issn	1946-1569
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/43379
dc.publisher	IEEE
dc.source.beginpage	45
dc.source.conference	International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
dc.source.conferencedate	SEP 27-29, 2023
dc.source.conferencelocation	Kobe
dc.source.endpage	48
dc.source.journal	N/A
dc.source.numberofpages	4
dc.subject.keywords	MONOLAYER
dc.title	Quantum Transport Study of Contact Resistance of Edge- and Top-Contacted Two-Dimensional Materials
dc.type	Proceedings paper
dspace.entity.type	Publication
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