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Phase formation and thermal stability of ultrathin nickel-silicides on Si(100)

Date

2010
Journal article
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dc.contributor.authorDe Keyser, K.
dc.contributor.authorVan Bockstael, C.
dc.contributor.authorVan Meirhaeghe, R.L.
dc.contributor.authorDetavernier, C.
dc.contributor.authorVerleysen, Eveline
dc.contributor.authorBender, Hugo
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorJordan-Sweet, J.
dc.contributor.authorLavoie, C.
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-10-18T15:48:16Z
dc.date.available2021-10-18T15:48:16Z
dc.date.issued2010
dc.identifier.issn0003-6951
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16946
dc.source.beginpage173503
dc.source.issue17
dc.source.journalApplied Physics Letters
dc.source.volume96
dc.title

Phase formation and thermal stability of ultrathin nickel-silicides on Si(100)

dc.typeJournal article
dspace.entity.typePublication
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