Publication:
Vapor-deposited octadecanethiol masking layer on copper to enable area selective Hf3N4 atomic layer deposition on dielectrics studied by in situ spectroscopic ellipsometry
Date
Loading...
Files
Journal
Abstract
Description
Metrics
Views
1921 since deposited on 2021-10-25
3last month
2last week
Acq. date: 2026-01-09
Citations
Metrics
Views
1921 since deposited on 2021-10-25
3last month
2last week
Acq. date: 2026-01-09
Citations