Vapor-deposited octadecanethiol masking layer on copper to enable area selective Hf3N4 atomic layer deposition on dielectrics studied by in situ spectroscopic ellipsometry

Publication:

2018

Journal article

Author(s)

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Journal of Vacuum Science and Technology A

1922 since deposited on 2021-10-25

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Acq. date: 2026-03-16