Publication:

GeSn technology: impact of Sn on Ge CMOS applications

Date

2011
Proceedings Paper
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dc.contributor.authorZaima, S.
dc.contributor.authorNakatsuka, O.
dc.contributor.authorShimura, Y.
dc.contributor.authorAdachi, M.
dc.contributor.authorNakamura, M.
dc.contributor.authorTakeuchi, S.
dc.contributor.authorVincent, Benjamin
dc.contributor.authorGencarelli, Federica
dc.contributor.authorClarysse, Trudo
dc.contributor.authorDemeulemeester, J.
dc.contributor.authorTemst, K.
dc.contributor.authorVantomme, Andre
dc.contributor.authorCaymax, Matty
dc.contributor.authorLoo, Roger
dc.contributor.imecauthorVincent, Benjamin
dc.contributor.imecauthorVantomme, Andre
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorLoo, Roger
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-19T22:09:58Z
dc.date.available2021-10-19T22:09:58Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20189
dc.source.beginpage231
dc.source.conferenceULSI Process Integration 7
dc.source.conferencedate9/10/2011
dc.source.conferencelocationBoston, MA USA
dc.source.endpage238
dc.title

GeSn technology: impact of Sn on Ge CMOS applications

dc.typeProceedings paper
dspace.entity.typePublication
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