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Ruthenium Atomic Layer Deposition (ALD)-enabled selectivity of Cobalt Electroless Layer Deposition (ELD) on dielectrics

Date

2016
Meeting abstract
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dc.contributor.authorZyulkov, Ivan
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorArmini, Silvia
dc.contributor.imecauthorZyulkov, Ivan
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.date.accessioned2021-10-23T18:00:51Z
dc.date.available2021-10-23T18:00:51Z
dc.date.embargo9999-12-31
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27681
dc.source.beginpage145
dc.source.conferenceMaterials for Advanced Metallizaiton Conference - MAM
dc.source.conferencedate20/03/2016
dc.source.conferencelocationBrussels Belgium
dc.source.endpage146
dc.title

Ruthenium Atomic Layer Deposition (ALD)-enabled selectivity of Cobalt Electroless Layer Deposition (ELD) on dielectrics

dc.typeMeeting abstract
dspace.entity.typePublication
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