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Exploration of new resist chemistries and process methods for enabling dual-tone development
Publication:
Exploration of new resist chemistries and process methods for enabling dual-tone development
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Date
2009
Proceedings Paper
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19620.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Fonseca, Carlos
;
Somervell, M.
;
Scheer, S.
;
Kuwahara, Y.
;
Nafus, Kathleen
;
Gronheid, Roel
;
Tarutani, S.
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1925
since deposited on 2021-10-17
Acq. date: 2025-12-12
Citations
Metrics
Views
1925
since deposited on 2021-10-17
Acq. date: 2025-12-12
Citations