Publication:

Influence of the ion bombardment of O2 plasmas on low-k materials

Date

2011
Journal article
https://doi.org/10.1016/j.tsf.2011.06.046
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dc.contributor.authorVerdonck, Patrick
dc.contributor.authorSamara, Vladimir
dc.contributor.authorGoodyear, Alec
dc.contributor.authorFerchichi, Abdelkarim
dc.contributor.authorVan Besien, Els
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBraithwaite, Nicholas
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorVan Besien, Els
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecVan Besien, Els::0000-0002-5174-2229
dc.date.accessioned2021-10-19T20:58:34Z
dc.date.available2021-10-19T20:58:34Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.doi10.1016/j.tsf.2011.06.046
dc.identifier.issn0040-6090
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20052
dc.source.beginpage464
dc.source.endpage468
dc.source.issue1
dc.source.journalThin Solid Films
dc.source.volume520
dc.title

Influence of the ion bombardment of O2 plasmas on low-k materials

dc.typeJournal article
dspace.entity.typePublication
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