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Optimizing EUV Imaging Metrics as a Function of Absorber Thickness and Illumination Source: Simulation Case Study of Ta-Co alloys

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dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorThakare, Devesh
dc.contributor.authorDelabie, Annelies
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorThakare, Devesh
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecThakare, Devesh::0000-0003-3265-7042
dc.contributor.orcidimecDelabie, Annelies::0000-0001-9739-7419
dc.date.accessioned2023-06-08T09:30:14Z
dc.date.available2022-12-11T03:11:06Z
dc.date.available2022-12-19T10:37:56Z
dc.date.available2023-06-08T09:30:14Z
dc.date.embargo2022-12-01
dc.date.issued2022
dc.identifier.doi10.1117/12.2640098
dc.identifier.eisbn978-1-5106-6050-2
dc.identifier.isbn978-1-5106-6049-6
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40858
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 124720A
dc.source.conference37th European Mask and Lithography Conference
dc.source.conferencedateJUN 20-23, 2022
dc.source.conferencelocationLeuven
dc.source.journalProceedings of SPIE
dc.source.numberofpages19
dc.source.volume12472
dc.title

Optimizing EUV Imaging Metrics as a Function of Absorber Thickness and Illumination Source: Simulation Case Study of Ta-Co alloys

dc.typeProceedings paper
dspace.entity.typePublication
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