Source mask optimization ( SMO) study for high-NA EUV lithography to achieve single patterning on random logic metal

dc.contributor.author	Hwang, Soobin
dc.contributor.author	Gillijns, Werner
dc.contributor.author	De Gendt, Stefan
dc.contributor.author	Kim, Ryan Ryoung Han
dc.contributor.imecauthor	Hwang, Soobin
dc.contributor.imecauthor	de Gendt, Stefan
dc.contributor.imecauthor	Gillijns, Werner
dc.contributor.imecauthor	Kim, Ryan Ryoung han
dc.contributor.orcidimec	De Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimec	Gillijns, Werner::0000-0002-2430-7360
dc.date.accessioned	2024-08-26T09:11:00Z
dc.date.available	2024-06-15T17:25:02Z
dc.date.available	2024-08-26T09:11:00Z
dc.date.embargo	2024-04-10
dc.date.issued	2024
dc.identifier.doi	10.1117/12.3010869
dc.identifier.eisbn	978-1-5106-7215-4
dc.identifier.isbn	978-1-5106-7214-7
dc.identifier.issn	0277-786X
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/44033
dc.publisher	SPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage	Art. 129540X
dc.source.conference	Conference on DTCO and Computational Patterning III
dc.source.conferencedate	FEB 26-29, 2024
dc.source.conferencelocation	San Jose
dc.source.journal	Proceedings of SPIE
dc.source.numberofpages	9
dc.title	Source mask optimization ( SMO) study for high-NA EUV lithography to achieve single patterning on random logic metal
dc.type	Proceedings paper
dspace.entity.type	Publication
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