Publication:

Source mask optimization ( SMO) study for high-NA EUV lithography to achieve single patterning on random logic metal

Date

2024
Proceedings Paper
https://doi.org/10.1117/12.3010869
Simple item page Full metadata Statistics
 
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0009-0009-9504-1852
cris.virtual.orcid0000-0003-3775-3578
cris.virtual.orcid0000-0002-2430-7360
cris.virtual.orcid0009-0002-3327-5169
cris.virtualsource.department71fc66b5-5209-46b6-b4b5-9c55681cdc1d
cris.virtualsource.department1fd77399-4d0a-4004-8a7f-9634c67c90de
cris.virtualsource.department7a43e54d-9897-45de-884c-e7dcd19acb63
cris.virtualsource.department3133fd1f-edd3-4f57-83bd-255a85992bcd
cris.virtualsource.orcid71fc66b5-5209-46b6-b4b5-9c55681cdc1d
cris.virtualsource.orcid1fd77399-4d0a-4004-8a7f-9634c67c90de
cris.virtualsource.orcid7a43e54d-9897-45de-884c-e7dcd19acb63
cris.virtualsource.orcid3133fd1f-edd3-4f57-83bd-255a85992bcd
dc.contributor.authorHwang, Soobin
dc.contributor.authorGillijns, Werner
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorKim, Ryan Ryoung Han
dc.contributor.imecauthorHwang, Soobin
dc.contributor.imecauthorde Gendt, Stefan
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.date.accessioned2024-08-26T09:11:00Z
dc.date.available2024-06-15T17:25:02Z
dc.date.available2024-08-26T09:11:00Z
dc.date.embargo2024-04-10
dc.date.issued2024
dc.identifier.doi10.1117/12.3010869
dc.identifier.eisbn978-1-5106-7215-4
dc.identifier.isbn978-1-5106-7214-7
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/44033
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 129540X
dc.source.conferenceConference on DTCO and Computational Patterning III
dc.source.conferencedateFEB 26-29, 2024
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.numberofpages9
dc.title

Source mask optimization ( SMO) study for high-NA EUV lithography to achieve single patterning on random logic metal

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
129540X.pdf
Size:
982.58 KB
Format:
Adobe Portable Document Format
Description:
Published version
Download
Publication available in collections:
Conference contributions