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Electromigration study of ultra narrow copper lines in low-k dielectric
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Electromigration study of ultra narrow copper lines in low-k dielectric
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Date
2007
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Croes, Kristof
;
Moon, Kwang Jin
;
Carbonell, Laure
;
Struyf, Herbert
;
Heylen, Nancy
;
Tokei, Zsolt
;
Beyer, Gerald
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1911
since deposited on 2021-10-16
1
last month
Acq. date: 2025-12-15
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Metrics
Views
1911
since deposited on 2021-10-16
1
last month
Acq. date: 2025-12-15
Citations