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Secondary ion mass spectrometry: a tool for surface and in-depth analysis

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dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-09-29T13:20:56Z
dc.date.available2021-09-29T13:20:56Z
dc.date.embargo9999-12-31
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/960
dc.source.beginpage252
dc.source.conferenceALTECH 95: Analytical Techniques for Semiconductor Materials and Process Characterization II. Proceedings of the Satellite Sympo
dc.source.conferencedate28/09/1995
dc.source.conferencelocationDen Haag The Netherlands
dc.title

Secondary ion mass spectrometry: a tool for surface and in-depth analysis

dc.typeProceedings paper
dspace.entity.typePublication
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