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Atomic layer deposition of ruthenium at 100°C using the RuO4-precursor and H2
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1961 since deposited on 2021-10-22
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Acq. date: 2026-08-06
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Statistics
Views
1961 since deposited on 2021-10-22
3last month
1last week
Acq. date: 2026-08-06
Citations