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Atomic layer deposition of ruthenium at 100°C using the RuO4-precursor and H2
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1957 since deposited on 2021-10-22
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Acq. date: 2026-05-16
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Statistics
Views
1957 since deposited on 2021-10-22
5last month
1last week
Acq. date: 2026-05-16
Citations