Publication:
Challenges and solutions ensuring EUVL photomask integrity
Date
| dc.contributor.author | Brux, O. | |
| dc.contributor.author | Dress, P. | |
| dc.contributor.author | Schmalfuss, H. | |
| dc.contributor.author | Jonckheere, Rik | |
| dc.contributor.author | Koolen-Hermkens, W. | |
| dc.contributor.imecauthor | Jonckheere, Rik | |
| dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
| dc.date.accessioned | 2021-10-20T10:09:48Z | |
| dc.date.available | 2021-10-20T10:09:48Z | |
| dc.date.issued | 2012 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20401 | |
| dc.source.beginpage | 84411J | |
| dc.source.conference | Photomask and Next-Generation Lithography Mask Technology XIX | |
| dc.source.conferencedate | 17/04/2012 | |
| dc.source.conferencelocation | Yokohama Japan | |
| dc.title | Challenges and solutions ensuring EUVL photomask integrity | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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