Publication:

Full field EUV lithography: lessons learnt on EUV ADT imaging, EUV resist, and EUV reticles

Date

2008
Proceedings Paper
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dc.contributor.authorHendrickx, Eric
dc.contributor.authorGoethals, Mieke
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorLorusso, Gian
dc.contributor.authorHermans, Jan
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorRonse, Kurt
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-17T07:36:10Z
dc.date.available2021-10-17T07:36:10Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13856
dc.source.beginpage714007
dc.source.conferenceSPIE Lithography Asia
dc.source.conferencedate4/11/2008
dc.source.conferencelocationTaipei Taiwan
dc.title

Full field EUV lithography: lessons learnt on EUV ADT imaging, EUV resist, and EUV reticles

dc.typeProceedings paper
dspace.entity.typePublication
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