Publication:

Demonstration of an N7 integrated fab process for metal oxide EUV photoresist

Date

2016
Proceedings Paper
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Author(s)

De Simone, Danilo  
;
Mao, Ming  
;
Kocsis, Michael  
;
De Schepper, Peter  
;
Lazzarino, Frederic  
;
Vandenberghe, Geert  
;
Yamashita, Fumiko
;
Stowers, Jason
;
Meyers, Steven
;
Grenville, Andrew
;
Luong, Vinh
;
Parnell, Doni
;
Clark, Benjamin L.

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