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Demonstration of an N7 integrated fab process for metal oxide EUV photoresist
Publication:
Demonstration of an N7 integrated fab process for metal oxide EUV photoresist
Date
2016
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Simone, Danilo
;
Mao, Ming
;
Kocsis, Michael
;
De Schepper, Peter
;
Lazzarino, Frederic
;
Vandenberghe, Geert
;
Yamashita, Fumiko
;
Stowers, Jason
;
Meyers, Steven
;
Grenville, Andrew
;
Luong, Vinh
;
Parnell, Doni
;
Clark, Benjamin L.
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2093
since deposited on 2021-10-23
Acq. date: 2025-10-23
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1
since deposited on 2021-10-23
Acq. date: 2025-10-23
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2093
since deposited on 2021-10-23
Acq. date: 2025-10-23
Citations