Publication:

Effect of dilute hydrogen peroxide in ultrapure water on SiGe epitaxial process

Date

2016
Proceedings Paper
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dc.contributor.authorMasaoka, Toru
dc.contributor.authorGan, Nobuko
dc.contributor.authorFujimura, Yu
dc.contributor.authorOgawa, Yuichi
dc.contributor.authorWostyn, Kurt
dc.contributor.authorPacco, Antoine
dc.contributor.authorYoshida, Yukifuni
dc.contributor.authorHolsteyns, Frank
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.date.accessioned2021-10-23T12:37:22Z
dc.date.available2021-10-23T12:37:22Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26976
dc.identifier.urlhttp://www.scientific.net/SSP.255.27
dc.source.beginpage27
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XIII
dc.source.conferencedate11/09/2016
dc.source.conferencelocationKnokke Belgium
dc.source.endpage30
dc.title

Effect of dilute hydrogen peroxide in ultrapure water on SiGe epitaxial process

dc.typeProceedings paper
dspace.entity.typePublication
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