Publication:

Enabling bottom-up nanoelectronics fabrication by selective sol-gel dielectric-on-dielectric deposition

Date

2021
Journal article
https://doi.org/10.1016/j.mseb.2020.114808
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dc.contributor.authorRedzheb, M.
dc.contributor.authorArmini, Silvia
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.date.accessioned2022-03-02T14:34:31Z
dc.date.available2022-03-02T14:34:31Z
dc.date.issued2021
dc.identifier.doi10.1016/j.mseb.2020.114808
dc.identifier.issn0921-5107
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39241
dc.publisherELSEVIER
dc.source.beginpage114808
dc.source.issuena
dc.source.journalMATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS
dc.source.numberofpages8
dc.source.volume263
dc.subject.keywordsTHIN LIQUID-FILMS
dc.subject.keywordsSELF-ORGANIZATION
dc.subject.keywordsMORPHOLOGIES
dc.subject.keywordsDROPLET
dc.subject.keywordsSUPPRESSION
dc.subject.keywordsEVAPORATION
dc.subject.keywordsPATTERNS
dc.title

Enabling bottom-up nanoelectronics fabrication by selective sol-gel dielectric-on-dielectric deposition

dc.typeJournal article
dspace.entity.typePublication
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