Localised strain characterisation in semiconductor structures using electron diffraction contrast imaging

dc.contributor.author	Janssens, Koenraad
dc.contributor.author	Van Der Biest, O.
dc.contributor.author	Vanhellemont, Jan
dc.contributor.author	Maes, Herman
dc.contributor.author	Hull, R.
dc.contributor.author	Bean, J. C.
dc.date.accessioned	2021-09-29T13:07:57Z
dc.date.available	2021-09-29T13:07:57Z
dc.date.embargo	9999-12-31
dc.date.issued	1995
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/693
dc.source.beginpage	66
dc.source.endpage	71
dc.source.issue	1
dc.source.journal	Materials Science and Technology
dc.source.volume	11
dc.title	Localised strain characterisation in semiconductor structures using electron diffraction contrast imaging
dc.type	Journal article
dspace.entity.type	Publication
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