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A new method to extract the silicon film thickness of enhancement mode fully depleted SOI nMOSFETs at 300K
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2020 since deposited on 2021-10-14
1last month
Acq. date: 2026-01-07
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2020 since deposited on 2021-10-14
1last month
Acq. date: 2026-01-07
Citations