Publication:

Modelling the lithography of ion implantation resists on topography

Date

2014
Proceedings Paper
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dc.contributor.authorWinroth, Gustaf
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorErcken, Monique
dc.contributor.authorRobertson, Stewart
dc.contributor.authorBiafore, John J.
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorErcken, Monique
dc.date.accessioned2021-10-22T08:20:45Z
dc.date.available2021-10-22T08:20:45Z
dc.date.embargo9999-12-31
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24824
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1857393
dc.source.beginpage90520Z
dc.source.conferenceOptical Microlithography XXVII
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.title

Modelling the lithography of ion implantation resists on topography

dc.typeProceedings paper
dspace.entity.typePublication
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