On the impact of the Si passivation layer thickness on the NBTI of nanoscaled Si0.45Ge0.55 pMOSFETs

Franco, Jacopo; Kaczer, Ben; Toledano Luque, Maria; Roussel, Philippe; Hehenberger, Philip; Grasser, Tibor; Mitard, Jerome; Eneman, Geert; Witters, Liesbeth; Hoffmann, Thomas Y.; Groeseneken, Guido

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On the impact of the Si passivation layer thickness on the NBTI of nanoscaled Si0.45Ge0.55 pMOSFETs

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2011

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Franco, Jacopo

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Kaczer, Ben

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Toledano Luque, Maria

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Microelectronic Engineering

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On the impact of the Si passivation layer thickness on the NBTI of nanoscaled Si0.45Ge0.55 pMOSFETs

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