Publication:
Impact of an etched EUV mask black border on imaging and overlay
Date
| dc.contributor.author | Davydova, N. | |
| dc.contributor.author | de kruif, R. | |
| dc.contributor.author | Fukugami, N. | |
| dc.contributor.author | Kondo, S. | |
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.author | Van Setten, E. | |
| dc.contributor.author | Connolly, B. | |
| dc.contributor.author | Lammers, A. | |
| dc.contributor.author | Vaenkatesan, V. | |
| dc.contributor.author | Zimmerman, J. | |
| dc.contributor.author | Harned, N. | |
| dc.contributor.imecauthor | Philipsen, Vicky | |
| dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
| dc.date.accessioned | 2021-10-20T10:28:09Z | |
| dc.date.available | 2021-10-20T10:28:09Z | |
| dc.date.issued | 2012 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20525 | |
| dc.source.beginpage | 852206 | |
| dc.source.conference | Photomask Technology | |
| dc.source.conferencedate | 10/09/2012 | |
| dc.source.conferencelocation | Monterey, CA USA | |
| dc.title | Impact of an etched EUV mask black border on imaging and overlay | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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