Publication:

Si-cap-free low-Dit SiGe gate stack for high-performance pFETs

Date

2020
Proceedings Paper
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dc.contributor.authorArimura, Hiroaki
dc.contributor.authorWostyn, Kurt
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorConard, Thierry
dc.contributor.authorVaisman Chasin, Adrian
dc.contributor.authorFranco, Jacopo
dc.contributor.authorMitard, Jerome
dc.contributor.authorHoriguchi, Naoto
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVaisman Chasin, Adrian
dc.contributor.imecauthorFranco, Jacopo
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVaisman Chasin, Adrian::0000-0002-9940-0260
dc.contributor.orcidimecFranco, Jacopo::0000-0002-7382-8605
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-28T20:10:39Z
dc.date.available2021-10-28T20:10:39Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34641
dc.identifier.urlhttps://iopscience.iop.org/article/10.1149/09805.0377ecst
dc.source.beginpage377
dc.source.conferencePRiME 2020: SiGe, Ge, and Related Compounds: Materials, Processing, and Devices 9
dc.source.conferencedate4/10/2020
dc.source.conferencelocationHonolulu (online) USA
dc.source.endpage386
dc.title

Si-cap-free low-Dit SiGe gate stack for high-performance pFETs

dc.typeProceedings paper
dspace.entity.typePublication
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