Publication:

Optimized illumination sources for through-pitch contact hole printing at 1.20 and 1.35NA.

Date

2007
Proceedings Paper
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dc.contributor.authorBekaert, Joost
dc.contributor.authorTruffert, Vincent
dc.contributor.authorWillems, Patrick
dc.contributor.authorVan Look, Lieve
dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorHendrickx, Eric
dc.contributor.authorVandenberghe, Geert
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorWillems, Patrick
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.date.accessioned2021-10-16T15:03:27Z
dc.date.available2021-10-16T15:03:27Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11710
dc.source.conference4th Immersion Symposium
dc.source.conferencedate8/10/2007
dc.source.conferencelocationKeystone, CO USA
dc.title

Optimized illumination sources for through-pitch contact hole printing at 1.20 and 1.35NA.

dc.typeProceedings paper
dspace.entity.typePublication
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