Publication:

Optical pumped InGaAs/GaAs nano-ridge laser epitaxially grown on a standard 300-mm Si wafer

Date

2017-11
Journal article
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dc.contributor.authorShi, Yuting
dc.contributor.authorWang, Zhechao
dc.contributor.authorVan Campenhout, Joris
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorGuo, Weiming
dc.contributor.authorKunert, Bernardette
dc.contributor.authorVan Thourhout, Dries
dc.contributor.imecauthorShi, Yuting
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorKunert, Bernardette
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.contributor.orcidimecKunert, Bernardette::0000-0002-8986-4109
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.date.accessioned2021-10-24T13:26:54Z
dc.date.available2021-10-24T13:26:54Z
dc.date.embargo9999-12-31
dc.date.issued2017-11
dc.identifier.issn2334-2536
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29427
dc.identifier.urlhttps://www.osapublishing.org/optica/abstract.cfm?uri=optica-4-12-1468
dc.source.beginpage1468
dc.source.endpage1473
dc.source.issue12
dc.source.journalOptica
dc.source.volume4
dc.title

Optical pumped InGaAs/GaAs nano-ridge laser epitaxially grown on a standard 300-mm Si wafer

dc.typeJournal article
dspace.entity.typePublication
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