Publication:
On the dependencies of the stochastic patterning-failure cliffs in EUVL
Date
| dc.contributor.author | De Bisschop, Peter | |
| dc.contributor.author | Hendrickx, Eric | |
| dc.contributor.imecauthor | De Bisschop, Peter | |
| dc.contributor.imecauthor | Hendrickx, Eric | |
| dc.date.accessioned | 2021-10-28T20:57:15Z | |
| dc.date.available | 2021-10-28T20:57:15Z | |
| dc.date.issued | 2020 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/34960 | |
| dc.identifier.url | https://doi.org/10.1117/12.2552179 | |
| dc.source.beginpage | 113230J | |
| dc.source.conference | Extreme Ultraviolet (EUV) Lithography XI | |
| dc.source.conferencedate | 23/02/2020 | |
| dc.source.conferencelocation | San Jose, CA USA | |
| dc.title | On the dependencies of the stochastic patterning-failure cliffs in EUVL | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |