Publication:

Surface characterization after different wet chemical cleans

Date

2001
Proceedings Paper
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dc.contributor.authorClaes, Martine
dc.contributor.authorRöhr, Erika
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Smedt, Frank
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorStorm, Wolfgang
dc.contributor.authorBauer, T.
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-14T16:41:56Z
dc.date.available2021-10-14T16:41:56Z
dc.date.embargo9999-12-31
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5144
dc.source.beginpage67
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS
dc.source.conferencedate18/09/2000
dc.source.conferencelocationOostende Belgium
dc.source.endpage70
dc.title

Surface characterization after different wet chemical cleans

dc.typeProceedings paper
dspace.entity.typePublication
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