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EUV reolution-LWR-sensitivity performance tradeoffs for a polymer bound PAG resist

Date

2010
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dc.contributor.authorGronheid, Roel
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorRathsack, Benjamin
dc.contributor.authorHooge, Joshua
dc.contributor.authorScheer, Steven
dc.contributor.authorNafus, Kathleen
dc.contributor.authorShite, Hideo
dc.contributor.authorKitano, Junichi
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorScheer, Steven
dc.contributor.imecauthorNafus, Kathleen
dc.date.accessioned2021-10-18T16:46:02Z
dc.date.available2021-10-18T16:46:02Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17196
dc.source.conference54th International conference on Electron, Ion and Photon Beam Technology and Nanofabrication - EIPBN
dc.source.conferencedate1/06/2010
dc.source.conferencelocationAnchorage, AL USA
dc.title

EUV reolution-LWR-sensitivity performance tradeoffs for a polymer bound PAG resist

dc.typeOral presentation
dspace.entity.typePublication
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