Publication:

Applicable solvent photoresist strip process for high-k/metal gate

Date

2010
Meeting abstract
Simple item page Full metadata Statistics
 
dc.contributor.authorWada, M
dc.contributor.authorTakahashi, H
dc.contributor.authorSnow, J
dc.contributor.authorVos, Rita
dc.contributor.authorMertens, PW
dc.contributor.authorShirakawa, H
dc.contributor.imecauthorVos, Rita
dc.date.accessioned2021-10-19T00:11:25Z
dc.date.available2021-10-19T00:11:25Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18321
dc.source.beginpage78
dc.source.conference10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS
dc.source.conferencedate20/09/2010
dc.source.conferencelocationOostende Belgium
dc.source.endpage79
dc.title

Applicable solvent photoresist strip process for high-k/metal gate

dc.typeMeeting abstract
dspace.entity.typePublication
Files

Original bundle

Name:
22057.pdf
Size:
280.05 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions