Publication:

Post extension ion implant photo resist strip for 32 nm technology and beyond

Date

2008
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dc.contributor.authorMannaert, Geert
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorShamiryan, Denis
dc.contributor.authorBoullart, Werner
dc.contributor.authorHan, Keping
dc.contributor.authorLuo, Shiian
dc.contributor.authorFalepin, Annelies
dc.contributor.authorSonnemans, Roger
dc.contributor.authorBerry, Ivan
dc.contributor.authorWaldfried, Carlo
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorFalepin, Annelies
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.accessioned2021-10-17T08:46:34Z
dc.date.available2021-10-17T08:46:34Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14115
dc.identifier.urlwww.ucpss.org
dc.source.conference9th International Symposium on Utra Clean Processing of Semiconductor Surfaces - UCPSS
dc.source.conferencedate21/09/2008
dc.source.conferencelocationBruges Belgium
dc.title

Post extension ion implant photo resist strip for 32 nm technology and beyond

dc.typeOral presentation
dspace.entity.typePublication
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