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Evaluation of advanced I-line resists for practical 0.5*(l/NA) lithography
Publication:
Evaluation of advanced I-line resists for practical 0.5*(l/NA) lithography
Date
1994
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Tzviatkov, Plamen
;
Pforr, Rainer
;
Jaenen, Patrick
;
Vertommen, Johan
;
Van den hove, Luc
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2070
since deposited on 2021-09-29
Acq. date: 2025-10-22
Citations
Metrics
Views
2070
since deposited on 2021-09-29
Acq. date: 2025-10-22
Citations