A new cleaning concept for particle and metal removal on Si surfaces

dc.contributor.author	Meuris, Marc
dc.contributor.author	Verhaverbeke, Steven
dc.contributor.author	Mertens, Paul
dc.contributor.author	Schmidt, Harald
dc.contributor.author	Rotondaro, Antonio
dc.contributor.author	Heyns, Marc
dc.contributor.imecauthor	Meuris, Marc
dc.contributor.imecauthor	Mertens, Paul
dc.contributor.imecauthor	Heyns, Marc
dc.contributor.orcidimec	Meuris, Marc::0000-0002-9580-6810
dc.date.accessioned	2021-09-29T12:55:06Z
dc.date.available	2021-09-29T12:55:06Z
dc.date.embargo	9999-12-31
dc.date.issued	1994
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/489
dc.source.beginpage	15
dc.source.conference	Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate	15/10/1993
dc.source.conferencelocation	New Orleans, LA USA
dc.source.endpage	25
dc.title	A new cleaning concept for particle and metal removal on Si surfaces
dc.type	Proceedings paper
dspace.entity.type	Publication
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