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Effective electrical passivation of Ge(100) for HfO2 gate dielectric layers using O2 plasma
Publication:
Effective electrical passivation of Ge(100) for HfO2 gate dielectric layers using O2 plasma
Date
2011
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Xie, Qi
;
Deduytsche, Davy
;
Schaekers, Marc
;
Caymax, Matty
;
Delabie, Annelies
;
Qu, Xin-Ping
;
Detavernier, Christophe
Journal
Electrochemical and Solid-State Letters
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1876
since deposited on 2021-10-19
Acq. date: 2025-10-23
Citations
Metrics
Views
1876
since deposited on 2021-10-19
Acq. date: 2025-10-23
Citations