Publication:
Flare mitigation strategies in extreme ultraviolet lithography
Date
| dc.contributor.author | Kim, Insung | |
| dc.contributor.author | Myers, Alan | |
| dc.contributor.author | Melvin, Lawrence | |
| dc.contributor.author | Ward, Brian | |
| dc.contributor.author | Lorusso, Gian | |
| dc.contributor.author | Jonckheere, Rik | |
| dc.contributor.author | Goethals, Mieke | |
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.imecauthor | Lorusso, Gian | |
| dc.contributor.imecauthor | Jonckheere, Rik | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.date.accessioned | 2021-10-17T07:59:40Z | |
| dc.date.available | 2021-10-17T07:59:40Z | |
| dc.date.issued | 2008 | |
| dc.identifier.issn | 0167-9317 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13950 | |
| dc.source.beginpage | 738 | |
| dc.source.endpage | 743 | |
| dc.source.issue | 5_6 | |
| dc.source.journal | Microelectronic Engineering | |
| dc.source.volume | 85 | |
| dc.title | Flare mitigation strategies in extreme ultraviolet lithography | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |