Investigation of Cl2 etch in view of extremely low temperature  selective epitaxial processes

dc.contributor.author	Hikavyy, Andriy
dc.contributor.author	Kruv, Anastaiia
dc.contributor.author	Van Opstal, Tinneke
dc.contributor.author	De Vos, Brecht
dc.contributor.author	Porret, Clément
dc.contributor.author	Loo, Roger
dc.contributor.imecauthor	Hikavyy, Andriy
dc.contributor.imecauthor	Van Opstal, Tinneke
dc.contributor.imecauthor	De Vos, Brecht
dc.contributor.imecauthor	Porret, Clément
dc.contributor.imecauthor	Loo, Roger
dc.contributor.orcidimec	Hikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimec	Porret, Clément::0000-0002-4561-348X
dc.contributor.orcidimec	Loo, Roger::0000-0003-3513-6058
dc.date.accessioned	2021-10-24T05:46:01Z
dc.date.available	2021-10-24T05:46:01Z
dc.date.embargo	9999-12-31
dc.date.issued	2017
dc.identifier.issn	0268-1242
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/28512
dc.identifier.url	http://iopscience.iop.org/article/10.1088/1361-6641/aa7e4b/pdf
dc.source.beginpage	114006
dc.source.issue	11
dc.source.journal	Semiconductor Science and Technology
dc.source.volume	32
dc.title	Investigation of Cl2 etch in view of extremely low temperature selective epitaxial processes
dc.type	Journal article
dspace.entity.type	Publication
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