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Characterization of strain in an advanced semiconductor laser structure with nanometer range resolution using a new algorithm for electron diffraction contrast imaging interpretation

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dc.contributor.authorJanssens, Koenraad
dc.contributor.authorVan Der Biest, O.
dc.contributor.authorVanhellemont, Jan
dc.contributor.authorMaes, Herman
dc.contributor.authorHull, R.
dc.date.accessioned2021-09-29T13:07:52Z
dc.date.available2021-09-29T13:07:52Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/691
dc.source.beginpage1530
dc.source.endpage3
dc.source.issue11
dc.source.journalAppl. Phys. Lett.
dc.source.volume67
dc.title

Characterization of strain in an advanced semiconductor laser structure with nanometer range resolution using a new algorithm for electron diffraction contrast imaging interpretation

dc.typeJournal article
dspace.entity.typePublication
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