Browsing imec Publications by imec author "9933caa2fda7ba29d13e7dcd5c984c2d298106c4"
Now showing items 1-3 of 3
-
Material and process optimization for EUV pattern rectification by DSA
Verstraete, Lander; Suh, Hyo Seon; Van Bel, Julie; Bak, Byeong-U; Kim, Seong Eun; Vallat, Remi; Bezard, Philippe; Beggiato, Matteo; Beral, Christophe (2024) -
Scaled-down deposited underlayers for EUV lithography
Gupta, Mihir; Afonso, Joao Antunes; Bezard, Philippe; Vallat, Remi; Fallica, Roberto; Suh, Hyo Seon; Halder, Sandip; De Simone, Danilo; Liu, Zecheng; Ran, Fanyong; Fukuda, Hideaki; Sun, Yiting; De Roest, David; Piumi, Daniele (2023) -
Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography
Lodha, Jayant K.; Pollentier, Ivan; Conard, Thierry; Vallat, Remi; De Gendt, Stefan; Armini, Silvia (2022)