Show simple item record

Formation of deep submicrometer cobalt silicated poly gate using bilayer processes

dc.contributor.authorWang, Qingfeng
dc.contributor.authorLauwers, Anne
dc.contributor.authorDeweerdt, Bruno
dc.contributor.authorVerbeeck, Rita
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-09-29T13:25:12Z
dc.date.available2021-09-29T13:25:12Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1006
dc.sourceIIOimport
dc.titleFormation of deep submicrometer cobalt silicated poly gate using bilayer processes
dc.typeProceedings paper
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorDeweerdt, Bruno
dc.contributor.imecauthorVerbeeck, Rita
dc.contributor.imecauthorMaex, Karen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage519
dc.source.endpage524
dc.source.conferenceProceedings of the 5th International Symposium on Ultra Large Scale Integration Science and Technology
dc.source.conferencedate21/05/1995
dc.source.conferencelocationReno, NV USA
imec.availabilityPublished - open access
imec.internalnotesECS Proceedings; Vol. 95-5


Files in this item

Thumbnail
Name:
986.pdf
Size:
425.1Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record