New CoSi2 SALICIDE technology for 0.1 µm processes and below

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Authors
Wang, Qingfeng; Maex, Karen; Kubicek, Stefan; Jonckheere, Rik; Kerkwijk, Bas; Verbeeck, Rita; Biesemans, Serge; De Meyer, Kristin
Conference
1995 Symposium on VLSI Technology. Digest of Technical Papers; 6-8 June 1995; Kyoto, Japan.
Title
New CoSi2 SALICIDE technology for 0.1 µm processes and below
Publication type
Proceedings paper
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