dc.contributor.author | Bekaert, Joost | |
dc.contributor.author | Philipsen, Vicky | |
dc.contributor.author | Vandenberghe, Geert | |
dc.contributor.author | van den Broeke, Doug | |
dc.contributor.author | Degel, Wolfgang | |
dc.contributor.author | Zibold, Axel | |
dc.date.accessioned | 2021-10-16T00:44:57Z | |
dc.date.available | 2021-10-16T00:44:57Z | |
dc.date.issued | 2005 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10077 | |
dc.source | IIOimport | |
dc.title | Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Bekaert, Joost | |
dc.contributor.imecauthor | Philipsen, Vicky | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.orcidimec | Bekaert, Joost::0000-0003-3075-3479 | |
dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
dc.source.peerreview | no | |
dc.source.beginpage | 59921O | |
dc.source.conference | 25th Annual BACUS Symposium on Photomask Technology | |
dc.source.conferencedate | 3/10/2005 | |
dc.source.conferencelocation | Monterey, CA USA | |
imec.availability | Published - imec | |
imec.internalnotes | Proceedings of SPIE; Vol. | |