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Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations

dc.contributor.authorBennett, Marylyn Hoy
dc.contributor.authorGrenville, Andrew
dc.contributor.authorHector, Scott
dc.contributor.authorPalmer, Shane
dc.contributor.authorLeunissen, Peter
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorBloomstein, Theodore
dc.contributor.authorHardy, Denis E.
dc.contributor.authorRothschild, Mordechai
dc.contributor.authorHilfiker, James N.
dc.date.accessioned2021-10-16T00:45:21Z
dc.date.available2021-10-16T00:45:21Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10083
dc.sourceIIOimport
dc.titleExperimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage599
dc.source.endpage610
dc.source.conferenceOptical Microlithography XVIII
dc.source.conferencedate27/02/2005
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 5754


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