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Thin epitaxial Si film growth at low temperatures for germanium processing applications

dc.contributor.authorBonzom, Renaud
dc.contributor.authorLeys, Frederik
dc.contributor.authorHellin, David
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-16T00:48:12Z
dc.date.available2021-10-16T00:48:12Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10126
dc.sourceIIOimport
dc.titleThin epitaxial Si film growth at low temperatures for germanium processing applications
dc.typeOral presentation
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewno
dc.source.conferenceASM International Epsilon User Meeting
dc.source.conferencedate29/09/2006
dc.source.conferencelocationMünchen Germany
imec.availabilityPublished - imec


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