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Si, SiGe and Ge: high carrier mobility technology through selective and non-selective epitaxial deposition

dc.contributor.authorCaymax, Matty
dc.date.accessioned2021-10-16T00:54:26Z
dc.date.available2021-10-16T00:54:26Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10195
dc.sourceIIOimport
dc.titleSi, SiGe and Ge: high carrier mobility technology through selective and non-selective epitaxial deposition
dc.typeOral presentation
dc.contributor.imecauthorCaymax, Matty
dc.source.peerreviewno
dc.source.conference15th European Conference on Chemical Vapor Deposition - EUROCVD-15
dc.source.conferencedate5/09/2005
dc.source.conferencelocationBochum Germany
imec.availabilityPublished - imec


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