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Development of automatic OPC treatment and layout decomposition for double dipole lithography for low K1-imaging

dc.contributor.authorChiou, T.-B.
dc.contributor.authorChen, A.
dc.contributor.authorHsu, Stephen D.
dc.contributor.authorEurlings, M.
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-16T00:56:45Z
dc.date.available2021-10-16T00:56:45Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10216
dc.sourceIIOimport
dc.titleDevelopment of automatic OPC treatment and layout decomposition for double dipole lithography for low K1-imaging
dc.typeProceedings paper
dc.contributor.imecauthorHendrickx, Eric
dc.source.peerreviewno
dc.source.beginpage21
dc.source.endpage31
dc.source.conferenceAdvanced Microlithographic Technologies
dc.source.conferencedate8/11/2004
dc.source.conferencelocationBejing China
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5645


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