dc.contributor.author | Witvrouw, Ann | |
dc.contributor.author | Roussel, Philippe | |
dc.contributor.author | Deweerdt, Bruno | |
dc.contributor.author | Maex, Karen | |
dc.date.accessioned | 2021-09-29T13:26:28Z | |
dc.date.available | 2021-09-29T13:26:28Z | |
dc.date.issued | 1995 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/1023 | |
dc.source | IIOimport | |
dc.title | The detrimental effect of a passivation on the electromigration lifetime of narrow Al-Si-Cu lines | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Roussel, Philippe | |
dc.contributor.imecauthor | Deweerdt, Bruno | |
dc.contributor.imecauthor | Maex, Karen | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 447 | |
dc.source.endpage | 452 | |
dc.source.conference | Materials Reliability in Microelectronics V | |
dc.source.conferencedate | 17/04/1995 | |
dc.source.conferencelocation | San Francisco, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | MRS Symposium Proceedings; Vol. 391 | |