Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography
dc.contributor.author | De Bisschop, Peter | |
dc.contributor.author | Erdmann, Andreas | |
dc.contributor.author | Rathsfeld, Andreas | |
dc.date.accessioned | 2021-10-16T01:06:25Z | |
dc.date.available | 2021-10-16T01:06:25Z | |
dc.date.issued | 2005 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10289 | |
dc.source | IIOimport | |
dc.title | Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | De Bisschop, Peter | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 243 | |
dc.source.endpage | 253 | |
dc.source.conference | Optical Microlithography XVIII | |
dc.source.conferencedate | 27/02/2005 | |
dc.source.conferencelocation | San Jose, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol. 5754 |