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Minimization of the MuGFET contact resistance by integration of NiSi contacts on epitaxially raised source/drain regions

dc.contributor.authorDixit, Abhisek
dc.contributor.authorRooyackers, Rita
dc.contributor.authorLeys, Frederik
dc.contributor.authorKaiser, Monja
dc.contributor.authorWeemaes, R.
dc.contributor.authorFerain, Isabelle
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorCollaert, Nadine
dc.contributor.authorSurdeanu, Radu
dc.contributor.authorGoodwin, Michael
dc.contributor.authorZimmerman, Paul
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.authorJurczak, Gosia
dc.contributor.authorBiesemans, Serge
dc.contributor.authorDe Meyer, Kristin
dc.contributor.editorKottantharayil, Anil
dc.date.accessioned2021-10-16T01:24:08Z
dc.date.available2021-10-16T01:24:08Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10397
dc.sourceIIOimport
dc.titleMinimization of the MuGFET contact resistance by integration of NiSi contacts on epitaxially raised source/drain regions
dc.typeProceedings paper
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewno
dc.source.beginpage445
dc.source.endpage448
dc.source.conferenceProceedings of the 35th European Solid-State Device Research Conference - ESSDERC
dc.source.conferencedate12/09/2005
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - imec
imec.internalnotesBest paper award


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